| 摘要 |
PURPOSE:To improve the reliability of the mask by forming the parts changed in properties which lower transmittance in prescribed patterns to the glass plate itself and constituting the parts changed in properties in such a manner that said parts from the exfoliation free patterns. CONSTITUTION:A resist film 15 is first formed atop the glass plate 11. This film 15 is then subjected to patterning. Dry etching using chlorine plasma is executed under prescribed conditions to impart physical and chemical damages to the exposed parts of the surface of the glass plate 11, by which the parts 13 changed in properties are formed in the prescribed patterns on the surface of the glass plate 11. Finally, the resist film 15 on the surface is removed and the mask 10 is completed. Since the patterns are the parts which are changed in properties and are formed to the glass plate itself, the possibility of exfoliation of the glass plate itself is eliminated at all. |
