| 摘要 |
PURPOSE:To improve sensitivity and resolution by forming the thin film which contains a high-polymer compd. having a crosslinkable section and the solubility of which to a solvent is changed by application of crosslinking energy by a Langmuir-Blodgett's method. CONSTITUTION:This thin film contains the high-polymer compd. having the crosslinkable section and the solubility thereof to the solvent is changed by the application of the crosslinking energy. Said thin film is formed by the Langmuir-Blodgett's method. The crosslinkable section of this high-polymer compd. is an alkyl group having carbon-carbon double bonds or epoxy group and participates in the formation of resist patterns by the application of the crosslinking energy. The high-polymer compd. is adequately polyamic acid, polyamic acid salt and polyamic ester into which the crosslinkable section is introduced. The resist film and resin film having high sensitivity, high resolution and dry etching resistance is thereby obtd. |
