| 摘要 |
<p>PURPOSE:To form up to four kinds of patterns on a wafer with one glass mask by arranging a square basic format, which forms patterns used up to four times in the transferring steps, in a grid-pattern on a square area. CONSTITUTION:The basic format 30 consisted of four patterns, each of which is formed on each part dividing a square range into quarters and is angled by 90 deg. to the other patterns in a reference direction; this basic format 30 is arranged in the grid-pattern. The square area is placed onto the wafer, and then the transfer of the patterns is carried out. Secondly, the glass mask 50 is rotated 90 deg. counterclockwise around its center O, the square area is placed onto the wafer, and then the transfer of the patterns is carried out. Thirdly the glass mask 50 is rotated 90 counterclockwise around its center O, the square area is placed onto the wafer, and the transfer of the pattern is carried out. Fourthly, the glass mask 50 is rotated 90 deg. counterclockwise around its center O, the square area is placed onto the wafer, and then the transfer of the patterns is carried out. Therefore, by using one glass mask, up to four kinds of patterns are formed on the wafer.</p> |
