发明名称 |
Apparatus for mounting workpieces |
摘要 |
In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.
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申请公布号 |
US4869801(A) |
申请公布日期 |
1989.09.26 |
申请号 |
US19880170716 |
申请日期 |
1988.03.21 |
申请人 |
LEYBOLD AKTIENGESELLSCHAFT |
发明人 |
HELMS, DIRK;KATZSCHNER, WERNER;PAWLAKOWITSCH, ANTON;ANDERLE, FRIEDRICH |
分类号 |
C23C14/34;C23C14/50;H01L21/00;H01L21/683 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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