发明名称 LASER-ENHANCED JET-PLATING AND JET-ETCHING: HIGH SPEED MASKLESS PATTERNING METHOD
摘要 <p>This metal deposition/material removal technique modifies free-standing or submerged jet plating with an electromagnetic energy beam such as an intense laser beam, directed collinearly along the jet. Experiments were made to deposit gold contact areas on nickel plated beryllium-copper substrates used for microelectronic connectors. The deposits are found to be crack-free and dense, possessing excellent adhesion to the substrate. Deposition rates for 0.05 cm diameter gold spots are on the order of 10 micrometers per second. Also disclosed is a laser jet chemical treatment system wherein relative motion between a cathodically connected workpiece and a fluid jet is provided. The laser beam which is collinear with the jet, cooperates with it to enhance plating or etching rate on the surface of the workpiece.</p>
申请公布号 CA1259947(A) 申请公布日期 1989.09.26
申请号 CA19840454199 申请日期 1984.05.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人
分类号 C25D5/02;C23F1/00;C25D5/08;C25F3/02;C25F3/14;H05K3/06;H05K3/24 主分类号 C25D5/02
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