| 摘要 |
PURPOSE:To obtain the positive type photosensitive resin composition with a rectangular cross-section of a resist after development by incorporating a specified cresol novolak resin and a specified photosensitive agent in the title composition. CONSTITUTION:The cresol novolak resin (A) which is obtd. by a condensing reaction of a mixture of methacresol and paracresol in a weight ratio of (35/65)-(65/35) and formaldehyde and has a softening point of 135-165 deg.C, and the photosensitive agent (B) contg. a compd. obtd. by allowing 1mol. of 2,3,4,4'- tetrahydroxybenzophenone to react with 4mol. of 1,2-naphthoquinone-2-diazide-5- sulfonyl chloride in an amount of 60-90wt.% based on the total amount of the photosensitive agent are incorporated in the composition in the weight ratio of (A)/(B) of the range of (87/13)-(71/29). Thus, the composition which has the rectangular cross-section of the resist after development and the high heat-resisting property and is applicable to a broad field such as a photographic industry, a printing industry and an electron industry, etc., is obtd. |
