发明名称 HITZEBESTAENDIGE UND PHOTOEMPFINDLICHE, AROMATISCHE POLYAMIDHARZE UND VERFAHREN ZU IHRER HERSTELLUNG
摘要 Aromatic polyamide resins having repeating units represented by the general formula (1) or (2) have photosensitivity and serve as heat resistant photosensitive materials even without addition of any sensitizer. <IMAGE> in the formulas (1) and (2) R<1> is an aromatic group, each of R<3>, R<4>, R<5> and R<6> is H or an aliphatic or aromatic group which has C-to-C double bond(s) and is dimerizable or polymerizable by, e.g., UV ray, and R<2> is an aliphatic or aromatic group and, when R<3> and R<4>, and R<5> and R<6> are hydrogen atoms, has C-to-C double bond(s) and is dimerizable or polymerizable by, e.g., UV ray. The polyamide resins can be prepared by reacting a diamine having the aromatic group R<1> with a dicarboxylic acid having the group R<2>, or its dihalide or diester. When R<3> and R<4> in (1) or (2), and also R<5> and R<6> in the case of (2), are H, the H atoms can be substituted by reacting the polyamide with a suitable carboxylic acid or its derivative or an epoxide.
申请公布号 DE3906684(A1) 申请公布日期 1989.09.21
申请号 DE19893906684 申请日期 1989.03.02
申请人 CENTRAL GLASS CO., LTD., UBE, YAMAGUCHI, JP 发明人 YAMAOKA, TSUGUO, MOTONAKAYAMA, FUNABASHI, JP;MARUYAMA, YUTAKA, MINAMIDAI, KAMIFUKUOKA, JP;TSUTSUMI, KENTARO, FUJIMA, KAWAGOE, JP;KOMORIYA, KARUHIKO, MINAMIDAI, KAMIFUKUOKA, JP
分类号 C08F2/46;C08G69/32;C08G69/48;G03F7/038 主分类号 C08F2/46
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