| 摘要 |
PURPOSE:To form the edge of a channel type light guide flush with the edge of an electrode by forming a metal oxide layer which lowers the refractive index of a diffused layer formed on a substrate surface and the electrode layer successively by vacuum deposition on the above-mentioned diffused layer and subjecting these layers respectively to etching to form a waveguide pattern, then thermally diffusing a metal oxide thereto. CONSTITUTION:After a Ti layer 8 is formed by a vacuum deposition method on the surface of the substrate 7, the Ti layer 8 is thermally diffused to form the Ti diffused layer 9 on the surface of the substrate 7; thereafter, the MgO layer 10 is formed thereon by vacuum deposition and the electrode layer 11 is formed by a vacuum deposition method. The MgO layer 10 and the electrode layer 11 are then partly etched in a part of the region in accordance with the electrode pattern to form the waveguide pattern A. Finally, the MgO layer 10 is thermally diffused for about 10hr at about 900 deg.C to form the channel type light guide B. The edge of the electrode is thereby formed flush with the edge of the channel type light guide. |
