发明名称 POSITION DETECTION APPARATUS FOR ALIGNMENT MARK
摘要 PURPOSE:To realize a high-speed and high-resolution detection by a position detection apparatus for an alignment mark and to control an X-ray aligner with high accuracy by a method wherein images of alignment marks on two objects are detected simultaneously by an image sensing device composed of a linear sensor by using a detection optical system. CONSTITUTION:Alignment marks on a wafer 1 and a mask 2 as two objects arranged to be away from each other by keeping a very small distance are reflected obliqueIy upward to the right by a plane 3a of a reflective prism 3 arranged at the upper part near the mask 2; their images are formed individually on an identical image-forming point P after they have passed through a reflecting mirror 5, a relay lens 6 and a cylindrical lens 7 by using a chromatic aberration objective 4. This cylindrical lens 7 may be arranged behind the image-forming point P as shown by a chain line, if circumstances require. An image formed at this image-forming point P passes through a relay lens 8 and a pattern barrier filter 9 and forms on an image-forming plane of a linear sensor 10. By this setup, the resolution of an A/D converter can be enhanced; accordingly, the detection accuracy can be increased furthermore when the linear sensor of many picture elements is used.
申请公布号 JPH01235335(A) 申请公布日期 1989.09.20
申请号 JP19880063921 申请日期 1988.03.16
申请人 SUMITOMO HEAVY IND LTD 发明人 MIYATAKE TSUTOMU
分类号 G03F9/00;H01L21/027 主分类号 G03F9/00
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