发明名称 Methods for the manufacture of cylindrical photosensitive resin structures and cylindrical printing plates
摘要 PCT No. PCT/JP86/00435 Sec. 371 Date Apr. 22, 1987 Sec. 102(e) Date Apr. 22, 1987 PCT Filed Aug. 23, 1986 PCT Pub. No. WO87/01213 PCT Pub. Date Feb. 26, 1987.A liquid photosensitive composition is introduced into a hollow cylindrical element and the latter is spun at a high speed to centrifugally deposit the liquid photosensitive composition uniformly on the inner surface of the hollow cylindrical element and cause the resin composition to cure in situ. The above process provides a seamless cylindrical photosensitive resin structure. After the centrifugal formation of a photosensitive resin layer on the inner surface of the hollow cylindrical element, the photosensitive resin may be back-exposed from within the hollow cylindrical element and relief-exposed from outside of the hollow cylindrical element though an image carrier. By the above method, resin plates and particularly those suited for flexographic printing can be manufactured, and using these resin plates, seamless image printing can be performed.
申请公布号 US4868090(A) 申请公布日期 1989.09.19
申请号 US19870051093 申请日期 1987.04.22
申请人 KITAMURA, ATSUSHI 发明人 KITAMURA, ATSUSHI;YOSHIMOTO, MAYUMI
分类号 B29C41/04;G03C1/74;G03C5/08;G03F7/16;G03F7/18;G03F7/24 主分类号 B29C41/04
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