| 摘要 |
PURPOSE:To shorten the time for a surface treatment of an object to be treated by a method wherein active oxygen obtained by irradiating ultraviolet rays onto nitrous oxide gas is supplied to the surface of the object to be treated and a prescribed surface treatment is executed in order to dissociate active oxygen O (<1>D) of high concentration. CONSTITUTION:A wafer 6 is placed on the surface of a wafer stage 5; the stage 5 is started to turn. When a valve 11 of a nitrous oxide gas supply source 2 is opened, nitrous oxide gas is introduced into a treatment chamber 1 through a pipe 3 and is diffused to the whole surface of the wafer 6 through a slight gap between the surface of the stage 5 and a glass sheet 8. An excitation reaction is caused by ultraviolet rays radiated from a lamp 9, and active oxygen 0 (<1>D) of high concentration is dissociated; accordingly, a resist which has been applied to the surface of the wafer 6 is oxidized and decomposed quickly to a volatile low molecule such as CO2, H2O, N2 or the like. By this setup, the time for a surface treatment of an object to be treated, i.e. the water 6, can be shortened. |
