| 摘要 |
The invention relates to a method for controlling a vacuum arc, as has been used in the form of so-called cold-cathode arc vaporisers for vaporising conductive materials, especially of metals having a wide-ranging use, for example for the purpose of reactive plasma-aided hard-material coating. The invention is based on the object of finding a method which minimises droplet formation and increases cathode material utilisation by reliably controlling the movement of the focus spot on the cathode. The object is achieved according to the invention by the voltage between the anode and cathode being applied in a pulsating manner and a laser pulse being aimed onto the cathode surface, in a defined location, in each case at maximum voltage.
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| 申请人 |
VEB HOCHVAKUUM DRESDEN, DDR 8017 DRESDEN, DD |
发明人 |
SCHULZE, DIETMAR, DIPL.-PHYS., DDR 8060 DRESDEN, DD;WILBERG, RUEDIGER, DIPL.-ING., DDR 8019 DRESDEN, DD;FLEISCHER, WERNER, DR.-ING., DDR 8036 DRESDEN, DD;POMPE, WOLFGANG, PROF. DR.SC.NAT., DDR 8027 DRESDEN, DD;SCHEIBE, HANS-JOACHIM, DR.RER.NAT., DDR 8021 DRESDEN, DD;SIEMROTH, PETER, DR.RER.NAT., DDR 1040 BERLIN, DD;STEIGMANN, EBERHARD, DDR 8021 DRESDEN, DD |
