发明名称 RESIST DEVELOPMENT DEVICE
摘要 PURPOSE:To assure the development constantly meeting the specified temperature requirements while enabling a mask in minor deviation of line width to be made by measuring the nozzle temperature by temperature measuring means. CONSTITUTION:An exposed mask 2 planarly mounted on a stage 2 is developed by spraying developer 6 contained in a pressurized tank 5 from a nozzle 4 while driving a motor 3 at low speed. That is, a valve 9 is opened by signals from a controller 8 to spray the developer 6 from the nozzle 4 resultantly lowering the temperature of the nozzle 4 however, the temperature signals measured by a thermistor 10 fixed to the nozzle 4 are inputted to the controller 8 so that the next development processing may be started only as far as the nozzle temperature is within the temperature range previously set up inside the controller 8. Through these procedures, the deviation of line width size between the masks 2 can be controlled with high precision.
申请公布号 JPH01228131(A) 申请公布日期 1989.09.12
申请号 JP19880055600 申请日期 1988.03.09
申请人 SIGMA GIJUTSU KOGYO KK 发明人 TAKANO MICHIAKI;INOUE YOSHIKAZU
分类号 H01L21/30;G03F7/00;G03F7/30;H01L21/027 主分类号 H01L21/30
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