摘要 |
PURPOSE:To assure the development constantly meeting the specified temperature requirements while enabling a mask in minor deviation of line width to be made by measuring the nozzle temperature by temperature measuring means. CONSTITUTION:An exposed mask 2 planarly mounted on a stage 2 is developed by spraying developer 6 contained in a pressurized tank 5 from a nozzle 4 while driving a motor 3 at low speed. That is, a valve 9 is opened by signals from a controller 8 to spray the developer 6 from the nozzle 4 resultantly lowering the temperature of the nozzle 4 however, the temperature signals measured by a thermistor 10 fixed to the nozzle 4 are inputted to the controller 8 so that the next development processing may be started only as far as the nozzle temperature is within the temperature range previously set up inside the controller 8. Through these procedures, the deviation of line width size between the masks 2 can be controlled with high precision. |