发明名称 PRODUCTION OF HIGH-PURITY TRANSLUCENT QUARTZ GLASS
摘要 PURPOSE:To obtain the title high-purity translucent quartz glass difficult to devitrify by enclosing silica powder as the raw material in a vessel, and treating the vessel at high temp. and pressure by a hot isotropic press to partially open the vessel. CONSTITUTION:The silica powder having >=about 99.9% purity is used as the starting material, and enclosed in the vessel made of quartz glass or a high- melting-point metal. The vessel is placed in a hot isotropic press device, and treated at a temp. of >=about 1,500 deg.C and at a pressure of >=about 10MPa by using an inert gas such as high-purity Ar as a pressure medium to partially open the vessel. In the course of the treatment, the inert gas as the pressure medium infiltrates into the vessel, small bubbles are generated in the quartz glass, and quartz glass made translucent is obtained. After treatment, the surface of the vessel used is shave off.
申请公布号 JPH01226747(A) 申请公布日期 1989.09.11
申请号 JP19880052727 申请日期 1988.03.08
申请人 TOSOH CORP 发明人 HONDA KEIJI;TSUKUMA KOJI;KONDO SHINICHI;SEGAWA HIDEAKI
分类号 C03C3/06;C03B19/06;C03B20/00 主分类号 C03C3/06
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