| 摘要 |
PURPOSE:To increase energy density and to shorten charging time by forming the patterns of resist film masks on a working electrode by a lithography process to change the formation capability of an electrolytically polymerized film on the surface of an electrode. CONSTITUTION:Methyl polyacrylate is spin-coated as a resist in the thickness of 100-200mum by a lithography process on a current collecting thin plate made of platinum, for instance, and exposed to form a resist film patterns 1 so that the diameter of no resist film circle 2 is 2-3mum. An aqueous solution of 1M aniline and 2M HClO4 is used as an electrolytic polymerization solution, and electrolytic polymerization is conducted in the condition of a current density of 10mA/cm<2>, an electrolytic charge of 1C/cm<2>, and a solution temperature of 30 deg.C in a three electrode method. The resist film pattern coating plate is used as a working electrode, a platinum plate as a counter electrode, and Agmus/ Ag as a reference electrode, and a porous polyaniline film is formed on the resist film pattern coating electrode. Energy density is increased and charging time is shortened. |
