| 摘要 |
1. Process for the production of a photoresist by coating a coating substrate with a radiation-sensitive coating solution comprising at least one binder which is insoluble in water, but soluble in aqueous-alkaline solutions, and at least one radiation-sensitive compound, such as diazoquinone, in a solvent, pre-drying the coating solution at elevated temperature, exposing the coating formed image-wise with actinic radiation, developing the coating by dissolving away the exposed areas using an aqueous-alkaline developer, and subsequently warming the material in order to harden the image coating, characterized in that the solvent for the radiation-sensitive compound contains or comprises propylene glycol alkyl ether acetate and in that the pre-drying is carried out in the range from about 20 to 110 degrees C in a manner such that the coating no longer feels tacky, but still contains residual solvent in an amount of from about 1 to 30 per cent by weight, based on the non-volatile components of the coating, and in that the radiation-sensitive compound employed is a product of the condensation of a diazoquinonesulphonyl chloride and a phenolic hydroxyl or polyhydroxyl compound, and arylamine or a polyamine. |
