METHODS OF DEPOSITING GERMANIUM CARBIDE

摘要

A prior art method of depositing Germanium Carbide involves the use of glow discharge techniques which are problematic in that they require high substrate temperatures. Methods embodying the present invention comprise exposing a target of germanium to a plasma comprising an inert gas and a halocarbon gas. The plasma is maintained by means of a radio frequency magnetron electrode which is associated with the target. Atoms and ions of Germanium and Carbon are sputtered onto the substrate in order to deposit the Germanium Carbide.