发明名称 |
SCANNING ELECTRON BEAM EXPOSURE SYSTEM |
摘要 |
A scanning electron beam exposure system includes two apertures (39a, 48a) for forming a rectangular beam (31). The cross section of the rectangular beam is changed by a deflection unit (47X, 47Y) arranged between the two apertures. The rectangular beam is refocused by a refocusing coil (51) to improve the peripheral sharpness of a projected image of the beam. The refocusing coil is controlled in accordance with the cross section (X1, Y1) of the beam. |
申请公布号 |
DE3279856(D1) |
申请公布日期 |
1989.09.07 |
申请号 |
DE19823279856 |
申请日期 |
1982.12.30 |
申请人 |
FUJITSU LIMITED |
发明人 |
YASUDA, HIROSHI;TSUCHIKAWA, HARUO;MIYAZAKI, TAKAYUKI |
分类号 |
H01J37/305;H01J37/30;H01J37/302;H01L21/027;(IPC1-7):H01J37/30 |
主分类号 |
H01J37/305 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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