| 摘要 |
PURPOSE:To improve the adhesiveness of an information recording layer and a substrate by forming the substrate of transparent plastic and providing an intermediate Si layer having 10-2,000Angstrom thickness between said substrate and the recording layer provided thereon. CONSTITUTION:The methods of forming the recording layer are sputtering, CVD, PVD, ion plating, etc. Above all, the good recording layer is obtainable with the plasma CVD method by using argon as gaseous plasma and SiH4 as reaction gas. The better effect is obtd. by subjecting the surface of the plastic substrate to sputter etching in an atmosphere of gas such as argon prior to formation of the recording layer. The recording medium adequate for mass production is thereby obtd. and the thermal stability thereof to recording and erasing utilizing the heat mode by laser light of the rugged shapes of the signal recording surface is improved. |
