| 摘要 |
PURPOSE:To improve adhesion to a metal and the removability of a hardened resist with an alkali removing soln. by using a photosensitive resin compsn. consisting of a base polymer, a specified photopolymerizable monomer and a photopolymn. initiator. CONSTITUTION:In a compsn. consisting of a base polymer (A), a photopolymerizable monomer (B) and a photopolymn. initiator (C), an ethylenic unsatd. compd. (b) contg. an acetoacetyl group is incorporated into at least a part of the monomer B. The pref. content is 1-100wt.%, especially 5-40wt.%. The base polymer A is preferably acrylic resin and the resin is copolymerized with about 15-30wt.% ethylenic unsatd. carboxylic acid when the compsn. is made developable with dil. alkali. The pref. amt. of the monomer B is 5-150 pts.wt., especially 40-100pts.wt. per 100pts.wt. polymer A. |
