| 摘要 |
PURPOSE:To form a unified pattern in the whole area of a substrate by monitoring the patterns of two spots in the innermost area and outermost area of a pattern area during development and dropping-down liquid developer from a nozzle in the middle area of the pattern area when the pattern width of the outermost area goes to be smaller than that of the innermost area. CONSTITUTION:While a glass board 2, for which the pattern is exposed in a concentric circle shape with a constant pitch, is revolved, liquid developer 4 is dropped down only from a nozzle 3 which is in the inside of the pattern area. The liquid developer 4 flows from an inside to an outside on the substrate 2 and the development is executed. While the development proceeds, a laser 5 is always transmitted through mirrors 6 and 11 at two points in the innermost area and outermost area of the pattern area and the refracting light quantity of a 0-th light and a primary light are simultaneously detected. Then, the pattern width is calculated by an arithmetic unit 9. Through a comparing circuit 10, when the pattern width of the outermost area goes to be small, an electromagnetic value 12 of the nozzle 3 in the middle area is opened and the liquid developer 4 is dropped down from the nozzle 3 in the middle area until the pattern width goes to be equal. Thus, the unified pattern can be formed over the whole area of the substrate. |
