| 摘要 |
PURPOSE:To form a unified pattern over the whole area of a substrate by monitoring the pattern of two spots in the innermost area and outermost area of a pattern area during development and controlling the dropping-down flow quantity of liquid developer from a nozzle in the middle area of the pattern area. CONSTITUTION:At first, while a glass substrate 2, for which the pattern is exposed in a concentric circle shape with a constant pitch, is revolved, liquid developer 4 is dropped down only from a nozzle 3 which is in the inside of the pattern area. The refracting liquid quantity of a laser 5 is simultaneously detected at two points in the innermost area and outermost area of the pattern area while the development proceeds and a pattern width is calculated by an arithmetic unit 9. Through a comparing circuit 10, in correspondence to a ratio between the pattern widths in the innermost area and outermost area, the dropping-down flow quantity of the nozzle 3 in the middle area is controlled by a flow quantity control part 12. Thus, the unified pattern can be formed over the whole area of the substrate. |
