| 摘要 |
PURPOSE:To obtain a rectangular resist pattern having an excellent heat- resisting property, even at the time of exposing the title composition with light beams having a short-wavelength by combining to use a naphthoquinone-1,2- diazidosulfonate having a dicyclopentadiene derivative and an alkali soluble resin for the title composition. CONSTITUTION:The photosensitive component contg. one or more of the naphthoquinone-1,2-diazidosulfonyl compd. per one of a dicyclopentadiene compd. is incorporated in the alkali-soluble resin. The photosensitive component has the high heat-resisting property and makes difficult to occur the deformation of the resist pattern at the time of thermally treating the composition. And, the composition has a high transparency at a short wavelength region. Thus, the resist pattern with the good rectangularity is obtd., and the positive type photoresist composition having the excellent heat-resisting property is obtd. |
