发明名称 Photosensitive composition.
摘要 <p>A photosensitive composition is described, wherein it comoprises a high-molecular compound having sulfonamide group to be insoluble in water, but soluble in an aqueous alkaline solution and a positive working photosensitive compound. The photosensitive composition is excellent in coatability and in developability when the composition is used for photosensitive lithographic printing plate.</p>
申请公布号 EP0330239(A2) 申请公布日期 1989.08.30
申请号 EP19890103424 申请日期 1989.02.27
申请人 FUJI PHOTO FILM CO., LTD. 发明人 AOSHIMA, KAITARO FUJI PHOTO FILM CO., LTD.;NAGASHIMA, AKIRA FUJI PHOTO FILM CO., LTD.
分类号 G03F7/023;G03F7/039 主分类号 G03F7/023
代理机构 代理人
主权项
地址