发明名称 FORMATION OF POLYIMIDE PATTERN
摘要 PURPOSE:To enhance adhesion between a polyimide film and a photoresist by interposing an interface modifying film made of a specified compound between the film of polyimide or its precursor and the photoresist. CONSTITUTION:The interface improving film made of aluminum alcoholate, such as aluminum isopropylate or monosec-butoxy-aluminum diisopropylate, or aluminum chelate, such as ethyl acetate aluminum diisopropylate or aluminum tris(ethyl acetate), is formed between the film of the polyimide having a low expansion coefficient of <=3X10<-5>K<-1> or its precursor obtained by heating the precursor varnish at <=250 deg.C, and semihardening it and the photoresist of a cyclic rubber type negative photoresist or the like.
申请公布号 JPH01214840(A) 申请公布日期 1989.08.29
申请号 JP19880039400 申请日期 1988.02.24
申请人 HITACHI LTD;HITACHI CHEM CO LTD 发明人 FUJISAKI KOJI;NUMATA SHUNICHI;MIWA TAKAO;IKEDA TAKAE
分类号 G03F7/26;C08G73/10;G03F7/11 主分类号 G03F7/26
代理机构 代理人
主权项
地址