| 摘要 |
PURPOSE:To improve the accuracy of a pattern made of organic film by etching glass as a mask, which is made by applying liquid glass to the recessed part of the patter and curing it after patterning the resist layer on the organic film. CONSTITUTION:While a substrate to be etched 1 is rotated, a lower layer organic film 2 made of novolak resin and an upper layer resist layer 3 made of DUV resist are applied to the substrate 1 in that order. After the pattern 4 is formed by patterning the layer 3, the liquid glass 5 is applied to the entire surface of the pattern by rotating it. Then, the glass 5 is padded in the recessed part 6 of the pattern 4 and is cured by heating. After the glass 5 on the pattern 4 is removed by etching back, the pattern 4 without the glass 5 and the film 2 are removed by oxygen reactive on-etching. If dilute solution of liquid glass is applied repeatedly, etchback can be omitted. |
