发明名称 EXPOSURE CONTROL SYSTEM
摘要 PURPOSE:To obtain an appropriate light quantity by producing and resetting a detecting output each time exposure quantity reaches a prescribed value, regarding the length of time when the number of producing times reaches a first prescribed value as a total exposing time, exposing by a second prescribed value less than that, and then flashing and exposing in the rest of time. CONSTITUTION:A photometric IC 100 obtains a photoelectric converted output corresponding to incident light quantity in condition where exposure is measured at open aperture. A photometric block 210 in a gate array 200 reacts and counts that; and then a photometric microcomputer 300 calculates a value for the incident light quantity as well as corresponding shatter speed and diaphragm based on the counted value. A microcomputer 400 for system control generates a signal regarding the shatter speed and diaphragm when receiving the calculated value. A photometric microcomputer 300 monitors the counted output of the gate array 200 and repeatedly alters counting conditions when overflow has occurred. On pressing a switch in a switch circuit 410, the microcomputer 400 commands the microcomputer 300 to switch to exposure control action so that a specified exposure action is performed. Even in exposing with flashing, this organization supplements exposure deficiency of other objects at the same time it maintains an appropriate light quantity for a main object.
申请公布号 JPH01214829(A) 申请公布日期 1989.08.29
申请号 JP19880041492 申请日期 1988.02.23
申请人 OLYMPUS OPTICAL CO LTD 发明人 SATO MAKOTO
分类号 G03B7/16;H04N5/238 主分类号 G03B7/16
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