发明名称 Semiconductor integrated circuit device
摘要 The inventive semiconductor integrated circuit device comprises a plurality of regularly disposed elementary units, each including a P channel MOS FET element paired with and an N channel MOS FET element. Desired ones of the elementary units each comprise a MOS field effect transistor having an ordinary form of a source-drain region formed by a diffusion region, while the remaining elementary units each have a diffusion region selectively connected to serve as a resistive element. Consequently, a desired circuit can be implemented without a resistive element being formed on each elementary unit.
申请公布号 US4862241(A) 申请公布日期 1989.08.29
申请号 US19850807831 申请日期 1985.12.11
申请人 SANYO ELECTRIC CO. LTD. 发明人 ASHIDA, YASUHIRO;YOKOTA, SHIGEKI
分类号 H01L27/04;H01L21/82;H01L21/822;H01L21/8234;H01L21/8238;H01L27/088;H01L27/092;H01L27/118;H01L29/78 主分类号 H01L27/04
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