发明名称 COMPOSITION FOR FORMATION OF RESISTIVE COATED FILM
摘要 <p>PURPOSE:To produce resisting coat film with stable quality, by forming the coat films of a composition comprising powders of an oxide of platinum group element, Indium oxide, glass powder creating crystal phase during a baking process, and ceramic, and an organic vehicle. CONSTITUTION:Oxides of the platinum group elements such as RuO2, RhO3, OsO2, IrO2, PtO2 have low resistivity. On the contrary, In2O3 is a semiconductor inclining toward an insulator, CdO is an N-type semiconductor, and SnO and SnO2 are resistors. These resistors can be combined properly with the oxides of the platinum group elements so that a resistance value can be changed as desired with a total amount of them unchanged substantially. Therefore, glass powder and ceramic powder can be mixed in substantially fixed proportions. Accordingly, it is possible to obtain resisting coat films with uniform quality, uniform adhesion to a base and uniform coefficients of expansion and contraction.</p>
申请公布号 JPH01211901(A) 申请公布日期 1989.08.25
申请号 JP19880036232 申请日期 1988.02.18
申请人 SUMITOMO METAL MINING CO LTD 发明人 KUBOTA TSUTOMU;ISHIGAME SHIGEHARU
分类号 H01C7/00;C03C8/04;C03C8/14;H01B3/08;H01B3/10 主分类号 H01C7/00
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