发明名称 METHODS AND APPARATUS FOR DEPOSITING THIN FILMS
摘要 <p>A fine mist of a solution (2) of a mixture of substances which contain the component chemical elements which are required in a resulting thin film is generated, for example, by atomising the solution in a spray head (4) using a carrier gas. The mist is transported to a heated reaction chamber (8) where it is decomposed and the components are deposited as a thin film on a substrate (10). The substrate may be in the form of a wire which thus obtains a coating. If the carrier gas is air or oxygen and an appropriate solution containing Y, Ba and Cu compounds is used, it is possible to deposit thin films or coatings which can be made superconducting. Alternatively, metal-chalcogenide thin films can be deposited.</p>
申请公布号 WO8907667(A1) 申请公布日期 1989.08.24
申请号 WO1989GB00114 申请日期 1989.02.07
申请人 ARON VECHT AND COMPANY LIMITED 发明人 SAUNDERS, ALAN
分类号 C23C16/30;C23C16/40;C23C16/448;H01L21/365;H01L21/368;H01L39/24;(IPC1-7):C23C16/40;C23C16/44 主分类号 C23C16/30
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