| 摘要 |
<p>PURPOSE:To homogenize a distribution of outgoing beams and improve positioning accuracy by a method wherein a plural number of light fluxes are provided and a light flux having a cross section according to the shape of a physical optical element is formed by overlapping a portion of the light fluxes. CONSTITUTION:Light beams emitted from light sources 1, 1a are made parallel by projector lenses 2, 2', respectively, and enters an exposure region including an alignment mark 41M via a beam splitter 92. the alignment mark 41M has a function of a convex lens which focuses the beam to a point Q on a transmission-type zone plate. A wafer alignment mark 41W has a function as a convex mirror which focuses the beams focused to the point Q and forms an image on a detecting plane 90 of a photodetector 38. Difference in position is calculated by the photodetector 38 and a wafer stage 102 is transferred according to this calculated value so as to align a mask 101 and a wafer 102.</p> |
