| 摘要 |
PURPOSE:To surely execute alignment and to improve throughput by covering with an opaque film under the transparent film of an alignment mark part. CONSTITUTION:On a transparent substrate 1 consisting of glass, etc., the alignment mark 2 of tantalum is brought to pattern formation, and on this mark 2, a metallic film 4 of chrome is brought to pattern formation, and also, it is formed in the periphery of the mark 2, as well, and on the metallic film 4, an ITO film 3 is formed and the whole is covered. When the alignment by a laser reflection waveform is executed by the alignment mark 2 having such a structure, a laser is limited to only reflection by an opaque film surface shape, not subjected to the influence under the transparent substrate 1, and on the other hand, even if the necessary reflection cause exists on the transparent substrate 1, when it is thinner than film thickness of the mark 2, an edge of the mark 2 can be separated exactly on the reflection waveform. In such a way, the alignment can be executed exactly, and the throughput can be improved. |
