首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
ELECTRON BEAM EXPOSURE METHOD
摘要
申请公布号
JPH01205421(A)
申请公布日期
1989.08.17
申请号
JP19880029531
申请日期
1988.02.10
申请人
FUJITSU LTD
发明人
KAI JUNICHI;YASUDA HIROSHI
分类号
H01L21/30;H01L21/027
主分类号
H01L21/30
代理机构
代理人
主权项
地址
您可能感兴趣的专利
SYRINGE ADAPTER WITH A DRIVER FOR AGITATION OF THE SYRINGE CONTENT
CHLORINATED POLYOLEFINS AND PROCESS FOR THEIR PRODUCTION
METAL SHEET MATERIAL WITH SUPERIOR CORROSION RESISTANCE
Hand-held building data recording and processing device
Plant stand with collapsible legs
SURGICAL SCALPEL WITH RETRACTABLE GUARD
HI-RAIL VEHICLE
Dedicated connection between CPU and network interface in multi-processor systems
Regulating energy consumption
A bound materials core measuring device
Determining sonde error for an induction or propagation tool with transverse or triaxial arrays
Aircraft using both turbojet and rocket propulsion
Upright type vacuum cleaner with a pivoting handle
Apparatus for use in positioning hinges and locks
Digging tool
Forklift
Acoustic emission
Base for a communications tower
Adaptable furniture
A Fire-extinguishing appliance