| 摘要 |
PURPOSE:To remove resist and the components of the resist from the inside of a pattern in development, by making centrifugal force act on the surface of a semiconductor substrate vertically. CONSTITUTION:Chip holders 3 are attached to the bottom part of a centrifugal rotary container 1. A chip is inserted into the chip holders 3. Thereafter, a cap 4 is attached to the centrifugal rotary container 1. When the centrifugal rotary machine is rotated at a high speed, developer is collected to the wall of the container 1. The vertical wall of the developer is formed from the cap 4 to the bottom of the container 1. Therefore, the chip is completely immersed in the developer. Since the centrifugal force vertically acts on the surface of the chip, the discharge of resist and the injection of the developer are performed in the direction perpendicular to the chip. After the specified developing time has elapsed, the rotary speed is made low. Then, the developer flows toward the central part of the container 1. The developer is discharged through a draining port 2. In this way, the resist components and the used developer are completely removed. |
