发明名称 GaAs field effect transistor having a WSi Schottky gate electrode improved for high-speed operation
摘要 A GaAs Schottky gate field effect transistor includes a GaAs substrate, source and drain electrodes ohmically attached to separated first and second parts of the GaAs substrate and a gate electrode of WSi contacted with a third part of the GaAs substrate between the first and second parts of the GaAs substrate, the gate electrode having a gate width of 30 to 60 mu m.
申请公布号 US4857975(A) 申请公布日期 1989.08.15
申请号 US19870085978 申请日期 1987.08.14
申请人 NEC CORPORATION 发明人 HIRAYAMA, HIROMITSU
分类号 H01L27/095;H01L21/338;H01L29/47;H01L29/812 主分类号 H01L27/095
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