发明名称 METHOD AND DEVICE FOR DETECTING FOREIGN MATTER
摘要 PURPOSE:To detect extremely small foreign matter on a rugged protection film by projecting light with specific wavelength on a sample which has the protection film on a circuit pattern and detecting the foreign matter on the protection film with diffracted light from on the protection film. CONSTITUTION:When the circuit pattern 103 which is applied with the organic protection film 104 is irradiated downward with the light 203b of <=380nm in wavelength from a laser oscillator 14, light 203b which strikes the organic protection film 104 is absorbed by the organic protection film 104 and no scattered light is generated, but light 203b which strikes on the foreign matter 5b generates scattered light 205b, which is converged by a scattered light detection system 3 and detected by a photoelectric converting element 302b to detect the extremely small foreign matter 5b. Further, regularly reflected light 206 and diffracted light 207 which causes misdetection are interrupted by a light shielding plate 441 and do not enter an integrating sphere 301b, so that only foreign matter scattered light 205b is detected without being affected by the ruggedness of the surface of the organic protection film 104.
申请公布号 JPH01201143(A) 申请公布日期 1989.08.14
申请号 JP19880023672 申请日期 1988.02.05
申请人 HITACHI LTD 发明人 YAMAUCHI YOSHIHIKO;AKIYAMA NOBUYUKI
分类号 G01N21/88;G01N21/33;G01N21/94;G01N21/956;G03F1/00;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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