| 摘要 |
PURPOSE:To obtain the title composition having remarkably high photosensitivity in an UV wavelength - a visible wavelength regions by incorporating a compd. having at least two ethylenically unsatd. bonds and specified polythiol compd. and iron complex salt in the composition as an essential component. CONSTITUTION:The compd. having at least two ethylenically unsatd. bonds, the polythiol compd. shown by formula I and the iron complex salt shown by formula II are incorporated in the composition as the essential component. In the formula, R is (n) valent org. residual group, (n) is an integer of 2-6, Cp is cyclopentadienyl group which may be substd. Ar is an aromatic hydrocarbon group which may be substd. X is an acid residual group. Thus, the composition having the remarkably high photosensitivity at an UV ray - a visible ray is obtd. |
