发明名称 |
MANUFACTURE OF COLOR SEPARATION FILTER |
摘要 |
<p>PURPOSE:To improve the size accuracy and alignment accuracy of an etching mask corresponding to respective color filters by forming a 3rd color filter which is obtained from the overlap part of 1st and 2nd color filters protected by 1st and 2nd etching prevention films of on a substrate. CONSTITUTION:The 1st color filter 4 is formed on the substrate 1 and the 1st etching prevention film 7 is formed on the surface; and the 2nd color filter 8 is formed and the 2nd etching prevention film 10 is formed on the substrate. Etching is carried out to remove the 2nd color filter 8 and 1st color filter 10 continuously and also removes the 1st and 2nd etching prevention films 7 and 10. Consequently, the 1st color filter 4 and the 3rd color filter consisting of the overlap of the 1st color filter 4 and 2nd color filter 8 are arranged on the substrate 1 while the high size accuracy and alignment accuracy are maintained.</p> |
申请公布号 |
JPH01200301(A) |
申请公布日期 |
1989.08.11 |
申请号 |
JP19880025887 |
申请日期 |
1988.02.05 |
申请人 |
TOPPAN PRINTING CO LTD |
发明人 |
SEKINE YASUHIRO;SUGIURA TAKEO |
分类号 |
G02B5/20;H01L27/14;H01L31/02;H04N9/07 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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