| 摘要 |
1281242 Redox composition VENTRON CORP 16 Feb 1970 [17 July 1969] 7338/70 Heading C1A [Also in Divisions C2 C3 C4 and D1] A photosensitive redox composition consists of (A) 0À5-3% by wt. of a Ti (IV) compound and (B) at least the same wt. per cent of at least one complexing agent selected from N-hydroxyethylenediamine triacetic acid, diethanolglycine, glucoheptanoic acid, galactonic acid, arabonic acid, gluconic acid, saccharic acid, mucic acid and the Na or NH 4 salts thereof, or PVA, in aqueous solution at pH 2-10. The Ti (IV) compound may be titanyl sulphate or titanyl chloride. The composition is made by mixing appropriate solutions of the components and adjusting the pH, e.g. using NH 4 OH. A product believed to be a polymer of formula (Cl 2 .Ti(OH) 2 ) n is made by dropping TiCl 4 slowly into ice-water. |
