Forming films, e.g. of amorphous silicon.

摘要

A film-forming apparatus comprising a high-frequency application electrode (10) and an earth electrode (20). The high-frequency applying electrode has an uneven surface with hills (50) and valleys (60). An amorphous silicon film is formed uniformly on a substrate (40) at a high speed by feeding a silicon-based gas into this apparatus and generating a glow discharge between the high-frequency application electrode (10) and the earth electrode (20), and positioning the substrate (40) in an atmosphere of the generated glow discharge.