发明名称 PROCESS FOR METALLIZING TRANSPARENT CONDUCTING STRIPS
摘要 <p>To metallize transparent conductive paths of indium tin oxide (ITO) on substrates of display devices, a solderable metal layer is applied by electroless deposition. If the metal layer is adjacent a liquid crystal display device, the display device may be manufactured and tested prior to the electroless deposition, with only an edge of the substrate being dipped into the deposition bath. Prior to the deposition of the solderable metal layer, the indium tin oxide surface may be reduced and an adhesion improving layer of may also be deposited by above the indium tin surface and below the solderable metal layer. Integrated circuits can then be soldered to the metallized conductive paths.</p>
申请公布号 EP0220541(B1) 申请公布日期 1989.08.09
申请号 EP19860113722 申请日期 1986.10.03
申请人 NOKIA GRAETZ GESELLSCHAFT MIT BESCHRANKTER HAFTUNG 发明人 ZONDLER, ROLF, DR.
分类号 G02F1/1345;B23K1/20;B23K35/14;C23C18/18;C23C18/31;G02F1/13;G09F9/30;H05K3/24 主分类号 G02F1/1345
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