发明名称 Photopatterned product of silicone polyamic acid on a transparent substrate
摘要 Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyimide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
申请公布号 US4855199(A) 申请公布日期 1989.08.08
申请号 US19880229667 申请日期 1988.08.08
申请人 GENERAL ELECTRIC COMPANY 发明人 BOLON, DONALD A.;EDDY, VICTORIA J.;HALLGREN, JOHN E.
分类号 G03F7/00;H01L21/027 主分类号 G03F7/00
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