发明名称 |
Photopatterned product of silicone polyamic acid on a transparent substrate |
摘要 |
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyimide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
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申请公布号 |
US4855199(A) |
申请公布日期 |
1989.08.08 |
申请号 |
US19880229667 |
申请日期 |
1988.08.08 |
申请人 |
GENERAL ELECTRIC COMPANY |
发明人 |
BOLON, DONALD A.;EDDY, VICTORIA J.;HALLGREN, JOHN E. |
分类号 |
G03F7/00;H01L21/027 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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