| 摘要 |
PURPOSE:To obtain a positioning apparatus having high accuracy and high reliability constituted so as to make it possible to prevent the change of a posture (change of inclination) at each moving position, by providing a moving stand, a drive means, a fixed stand, a moving stand support means and a close contact means. CONSTITUTION:A moving stand (alignment unit 4) moving with respect to a member (reticle 41, wafer 42) to be aligned, a drive means (XY stage) driving the moving stand a fixed stand (stage base stand 7) positionally fixed with respect to the member (reticle 41, wafer 42), a moving stand support means (support 1, parallel link plates 2a, 2b, elastic hinge 3) for supporting the bottom surface of the moving stand with respect to the reference surface of the fixed stand in a close contact and separable state and a close contact means (air cylinder 6, rod) for holding the moving stand to the reference surface in a close contact state are provided. The bottom surface of the moving stand and the reference surface of the fixed stand are uniformly formed with desired high accuracy so that the moving stand always holds a definite posture in such a state that bottom surface of the moving stand is closely brought into contact with the reference surface of the fixed stand. By this method, the falling of an alignment optical axis is not generated and highly accurate alignment can be performed. |
