发明名称 FET SENSOR
摘要 PURPOSE:To obtain an FET sensor which permits use stably for a long time, by employing a thin film comprising a functional compound and a thin film comprising a organic compound support surrounding it as a semiconductor layer thereof. CONSTITUTION:A gate electrode 2 is formed on an insulation substrate 1 and an insulation film 3 thereon 2 by an electron beam evaporation method. A thin film 4 comprising a functional compound and an organic compound surrounding it is formed between a source electrode 5 and a drain electrode 6 at a space in contact with the film 3. With such an arrangement, a current control between the electrodes 5 and 6 is accomplished by a gate voltage and a furthermore, the optimization of a function of the compound having a detecting function can be controlled by the gate voltage. Thus, as there is no reaction at a gate oxidation film interface, a sensor is obtained which can withstand use for a long time with a stable sensor characteristic. This also permits the control of the function thereby achieving the optimization of the detecting function.
申请公布号 JPH01193640(A) 申请公布日期 1989.08.03
申请号 JP19880018005 申请日期 1988.01.28
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TAKEYAMA KENICHI;KONDO SHIGEO;IWAMOTO NORIKO
分类号 G01N27/414;G01N27/30;G01N27/327;H01L29/78;H01L29/786;H01L31/10 主分类号 G01N27/414
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