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发明名称
PLANAR MAGNETRON SPUTTERING WITH MODIFIED FIELD CONFIGURATION
摘要
申请公布号
EP0148470(B1)
申请公布日期
1989.08.02
申请号
EP19840115772
申请日期
1984.12.19
申请人
HITACHI, LTD.
发明人
KOBAYASHI, SHIGERU;ABE, KATSUO;SAKATA, MASAO;KASAHARA, OSAMU;OGISHI, HIDETSUGU
分类号
C23C14/34;H01J37/34
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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