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发明名称
PROCESS OF FORMING A NEGATIVE PATTERN IN A PHOTORESIST LAYER
摘要
申请公布号
IL76702(A)
申请公布日期
1989.07.31
申请号
IL19850076702
申请日期
1985.10.14
申请人
U C B S.A.
发明人
分类号
G03F7/023;G03C1/00;G03C5/00;G03F7/022;G03F7/26;G03F7/36;G03F7/38;H01L21/027;H01L21/30;(IPC1-7):G03F7/26
主分类号
G03F7/023
代理机构
代理人
主权项
地址
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