发明名称 DEVELOPER TREATING DEVICE
摘要 PURPOSE:To prevent excessive temperature rises in a catalyst and peripheral devices when waste liquid treating continues for many hours by adjusting the quantity of the excess developer in response to temperature by a supply quantity adjusting means, and feeding to the catalyst. CONSTITUTION:When a fuel tank 98, a cover 116, and the interior of a discharge chamber 118 rise in temperature owing to oxidation, bimetals 138, which are fixed on upper walls 98A and hold a blocking member 132, are deformed; the blocking part 136 of the blocking member 132 moves toward lower walls 98B, thereby decreasing the substantial opening areas of supply paths 140. When calorific power falls, the bimetals 138 are deformed in the opposite direction to move the blocking part 136 of the blocking member 132 away from the lower walls 98B. By the blocking member 132 and the bimetals 138 all of which work as the supply adjusting means, the quantity of the excess vaporized developer supplied to the catalyst 108 is adjusted in response to temperature change. Thus, oxidation is continued by maintaining a specified temperature even when excess developer processing continues for many hours.
申请公布号 JPH01188890(A) 申请公布日期 1989.07.28
申请号 JP19880012101 申请日期 1988.01.22
申请人 FUJI PHOTO FILM CO LTD 发明人 YAMANA KEIICHI;YODA AKIRA
分类号 G03D3/02;G03G15/10;G03G15/11;G03G21/00 主分类号 G03D3/02
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