发明名称 METHOD FOR LIQUID PHASE EPITAXIAL GROWTH
摘要 PURPOSE:To remove an element of bad life property caused by meniscus line at selecting test for a short time, by a method wherein stripe direction of a substrate single-crystal is made perpendicular to sliding direction of a growing solution. CONSTITUTION:To obtain epitaxial layer by contacting a growing solution with a substrate single-crystal 13, the crystal 13 is fixed and the growing solution is slided. The crystal 13 is installed to a board so that stripe direction 15 of the crystal 13 is perpendicular to sliding direction 16 of the growing solution. Since meniscus line produced at the liquid phase epitaxial growing is made approximately parallel to stripe direction of an element, any element of bad life property caused by the meniscus line can be removed at selecting test for a short time.
申请公布号 JPS58196014(A) 申请公布日期 1983.11.15
申请号 JP19820078243 申请日期 1982.05.12
申请人 HITACHI SEISAKUSHO KK 发明人 KASHIWADA YASUTOSHI;KAJIMURA TAKASHI;AIKI KUNIO;SHIGE NORIYUKI;SAWAI MASAAKI
分类号 H01L21/208;H01S5/00 主分类号 H01L21/208
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