发明名称 |
METHOD FOR INSPECTING SYNTHETIC QUARTZ GLASS |
摘要 |
<p>PURPOSE:To easily decide whether synthetic quartz glass is defective or non- defective by projecting excimer laser light to the quartz glass and checking if the quartz glass generates red fluorescence or not. CONSTITUTION:The excimer laser light (A) is projected to the synthetic quartz glass to be used as a substrate for a photomask and whether said glass generates the red fluorescence of about 650nm or not is visually decided. Since the glass which generates the fluorescence has the degraded transmission performance in a UV region and, therefore, the use of such glass is averted. The laser light of 193nm wavelength by ArF or 248nm wavelength by KrF is preferably used for the laser light A.</p> |
申请公布号 |
JPH01189654(A) |
申请公布日期 |
1989.07.28 |
申请号 |
JP19880015158 |
申请日期 |
1988.01.26 |
申请人 |
NIPPON SEKIEI GLASS KK;YAMAGUCHI NIPPON SEKIEI KK |
发明人 |
NISHIZAWA SHIGERO;KUZUU SHIN |
分类号 |
C03B20/00;C03C3/06;G01M11/00;G01N21/64;G03F1/00;G03F1/60 |
主分类号 |
C03B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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