发明名称 SENSITIZING ACTIVATOR FOR CHEMICAL PLATING
摘要 <p>Disclosed is a sensitizing activator for chemical plating operations, that uniformly and efficiently deposits a substance capable of catalytically depositing a plating metal from a plating solution, such as colloidal palladium, on the surface of a material to be plated. The activator includes stannous chloride and palladium chloride colloidally dispersed in a solution of sodium chloride and a dilute concentration of an acid which is preferably sulfuric acid. A preferred formulation includes a small amount of vanillin. The activator provides exemplary permeation of and adhesion to a substrate to be plated, and advantageously avoids corrosion of the black oxide that is formed on the inner copper foil of copper-clad laminates.</p>
申请公布号 WO1989006710(A1) 申请公布日期 1989.07.27
申请号 US1989000102 申请日期 1989.01.11
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